In recent years, optical maskless lithography technique based on spatial light modulator(SLM) has been attracted wide attentions. 近年来，空间光调制器(SLM)无掩模光刻技术受到微电子及相关领域的广泛关注。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. 摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
The key of this research is studying or producing small amount of the Maskless Technology to taking place of tradition mask, and also fabricate TFT device. 本研究目的在于研发或少量生产得以无光罩微影技术取代传统光罩，并制作出TFT元件。
Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation making-sample, component analysis, film deposition and maskless etching. 聚焦离子束技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。
